The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2012

Filed:

Aug. 20, 2008
Applicants:

Han Soo Kim, Daejeon, KR;

Min Young Lim, Seongnam-si, KR;

Sung Hyun Kim, Daejeon, KR;

Yoon Hee Heo, Daejeon, KR;

Dae Hyun Kim, Daejeon, KR;

Ji Heum Yoo, Daejeon, KR;

Sun Hwa Kim, Daejeon, KR;

Inventors:

Han Soo Kim, Daejeon, KR;

Min Young Lim, Seongnam-si, KR;

Sung Hyun Kim, Daejeon, KR;

Yoon Hee Heo, Daejeon, KR;

Dae Hyun Kim, Daejeon, KR;

Ji Heum Yoo, Daejeon, KR;

Sun Hwa Kim, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 12/30 (2006.01); C08F 20/06 (2006.01); C08F 20/02 (2006.01); C08F 2/00 (2006.01); C08F 4/28 (2006.01); C08G 18/63 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.


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