The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Oct. 23, 2009
Applicant:
Yuki Shiota, Shinjuku-ku, JP;
Inventor:
Yuki Shiota, Shinjuku-ku, JP;
Assignee:
Hoya Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract
Provided is a mask blank substrate manufacturing method in which a low thermal expansion glass substrate containing titanium (Ti) oxide is polished using a polishing agent, then treated using an aqueous solution containing hydrofluoric acid, then cleaned using an acidic solution with a pH of 4 or less, and then further cleaned using an alkaline solution.