The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2012

Filed:

Oct. 25, 2010
Applicants:

Katsuya Sakayori, Shinjuku-ku, JP;

Shigeki Kawano, Shinjuku-ku, JP;

Hiroko Amasaki, Shinjuku-ku, JP;

Hidetsugu Tazawa, Shinjuku-ku, JP;

Kazunari Ikeda, Shinjuku-ku, JP;

Kouhei Ohno, Shinjuku-ku, JP;

Inventors:

Katsuya Sakayori, Shinjuku-ku, JP;

Shigeki Kawano, Shinjuku-ku, JP;

Hiroko Amasaki, Shinjuku-ku, JP;

Hidetsugu Tazawa, Shinjuku-ku, JP;

Kazunari Ikeda, Shinjuku-ku, JP;

Kouhei Ohno, Shinjuku-ku, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/00 (2006.01); B32B 27/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is provided a resin laminate having a layer construction of a first inorganic material layer/insulating layer/second inorganic material layer or a layer construction of an inorganic material layer/insulating layer, wherein the insulating layer has a multi-layer structure of two or more resin layers of a core insulating layer and an adhesive insulating layer. In this case, the resin laminate has the adhesive insulating layer which can realize optimal etching, is suitable for etching by a wet process, and has excellent adhesion. At least one of the layers constituting the insulating layer is formed of a polyimide resin which comprises repeating units represented by formula (1) and has a glass transition point of 150 to 360° C. and is dissolvable in a basic solution at a rate of more than 3 μm/min, preferably more than 5 μm/min, and most preferably more than 8 μm/min.


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