The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
May. 15, 2008
Applicants:
Ronghua Wei, San Antonio, TX (US);
Chris Rincon, San Antonio, TX (US);
Edward Langa, San Antonio, TX (US);
Inventors:
Ronghua Wei, San Antonio, TX (US);
Chris Rincon, San Antonio, TX (US);
Edward Langa, San Antonio, TX (US);
Assignee:
Southwest Research Institute, San Antonio, TX (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of performing plasma immersion ion processing (PIIP), particularly suited for processing three-dimensional objects. One or more such objects are placed in a conductive cage having solid or mesh walls. The cage completely encloses the objects. A voltage is applied to the cage, and the plasma is generated, resulting in the plasma being contained within the cage.