The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Dec. 19, 2007
Gunn Choe, San Jose, CA (US);
Yoshihiro Ikeda, San Jose, CA (US);
Masayoshi Shimizu, Tokyo, JP;
Kiwamu Tanahashi, Tokyo, JP;
Gunn Choe, San Jose, CA (US);
Yoshihiro Ikeda, San Jose, CA (US);
Masayoshi Shimizu, Tokyo, JP;
Kiwamu Tanahashi, Tokyo, JP;
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
Soft magnetic film fabricated with preferred uniaxial anisotropy for perpendicular recording. One type of cathode design has a field direction that is parallel to the direction of the Hex of the second SUL with a magnetically-pinned first SUL. In addition, SUL structures having low AP exchange energy also are disclosed. The SUL structure combines the cathode field direction of the SULwith the pinned SUL. The SULis magnetically pinned to the pinning layer and the pinning direction is parallel to the direction of the cathode field applied during deposition of the SUL. High Hc ferro-magnetic materials may be deposited onto a heated substrate that is magnetized along the radial direction by the cathode field. The pinning field may be higher than the cathode field, indicating that the cathode field during deposition of the SULcannot disturb the magnetic state of the SULpinned to pinning layer.