The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2012

Filed:

Sep. 23, 2009
Applicants:

Sean Haggerty, North Haven, CT (US);

Guy Hatch, Vernon, CT (US);

Sanh Phan, Southington, CT (US);

Inventors:

Sean Haggerty, North Haven, CT (US);

Guy Hatch, Vernon, CT (US);

Sanh Phan, Southington, CT (US);

Assignee:

On Site Gas Systems, Inc., Newington, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/047 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method is presented for reducing a concentration of ambient air used in a feed stream to form an inerting gas in a pressure swing adsorption system. The method includes introducing ambient air into a pressure swing adsorption system to form an inerting gas, introducing the inerting gas to a large volume of atmosphere, thereby inerting at least a portion of the large volume of atmosphere to form an inerted atmosphere, and removing a portion of the inerted atmosphere and introducing the portion of inerted atmosphere to the pressure swing adsorption system to form the inerting gas, thereby reducing an amount of ambient air utilized to form the inerting gas in the pressure swing adsorption system.


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