The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Feb. 21, 2008
Anne Catherine Morancy-meister, Dachsen, CH;
Thomas Egli, Volketswil, CH;
Rosemary Thompson, Seen, CH;
Nicole Gronau, Zurich, CH;
Walter Gross, Ossingen, CH;
Michael Motzko, Gröbenzell, DE;
Fabio Bernhardsgrütter, Winterthur, CH;
Jochen Reinmuth, Winterthur, CH;
Anne Catherine Morancy-Meister, Dachsen, CH;
Thomas Egli, Volketswil, CH;
Rosemary Thompson, Seen, CH;
Nicole Gronau, Zurich, CH;
Walter Gross, Ossingen, CH;
Michael Motzko, Gröbenzell, DE;
Fabio Bernhardsgrütter, Winterthur, CH;
Jochen Reinmuth, Winterthur, CH;
Zimmer GmbH, Winterthur, CH;
Abstract
An interspinous process spacer and method of implanting same is provided for maintaining separation between adjacent spinous processes of adjacent vertebrae. The spacer has two lateral portions and a medial portion therebetween, the medial portion adapted to reside between the adjacent superior and inferior spinous processes in the deployed configuration and the lateral portions each comprise a superior lateral portion and an inferior lateral portion adapted to reside on the lateral side of the respective superior and inferior spinous process in the deployed configuration to maintain positioning of the interspinous process spacer between the two adjacent vertebrae. The lateral portions each comprise an expandable lateral member.