The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Jul. 28, 2009
Tae Gyu Kim, Gyeonggi-do, KR;
Tae Gyu Kim, Gyeonggi-do, KR;
Jangjung Industrial Corp., Gyeonggi-Do, KR;
Abstract
The present invention relates to a four-sided dustproof mask including: an upper filter adapted to surround a wearer's nose area; a lower filter adapted to surround the wearer's chin area; and a protruded center filter adapted to attach the upper filter and the lower filter thereto in such a manner as to make the both ends of the upper filter and the lower filter correspond to center points formed at the both ends of a curved folding line dividing the protruded center filter into two sides, the curved folding line having a straight line portion having a predetermined length protrudedly extended from the center points thereof, whereby while the upper filter and the lower filter are being developed, the protruded center filter is protruded to a dome-like shape.