The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2012
Filed:
Dec. 09, 2009
Nobuhiko Kenmochi, Shiojiri, JP;
Nobuhiko Kenmochi, Shiojiri, JP;
Seiko Epson Corporation, , JP;
Abstract
A method for manufacturing an optical element that has a function to polarize and split incident light includes: a) forming a grid portion on a face of a substrate in a plural number with a predetermined pitch; b) forming a diffractive structure resist pattern on the face of the substrate; c) forming the diffractive structure by etching the substrate anisotropically in a thickness direction with the diffractive structure resist pattern; and d) forming a fine line on the grid portion by depositing a reflective material from an oblique direction onto the face of the substrate where the diffractive structure is provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile