The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2012
Filed:
Jun. 21, 2007
Qiwen Zhan, Mason, OH (US);
Qiwen Zhan, Mason, OH (US);
University of Dayton, Dayton, OH (US);
Abstract
Special polarization states are generated that have unique focusing properties that may be used to create extremely strong longitudinal fields. Combined with surface plasmon excitation, these polarization states can be used in apertureless near-field scanning optical microscopy systems. A radially polarized beam is directed into a plasmon-generating optical fiber comprising a metal coated, tapered, apertureless tip. The apertureless tip excites surface plasmon waves and direct the surface plasmon waves to the tip when a radially polarized beam propagates along the plasmon-generating optical fiber. An objective lens collects the near field optical signals from a sample positioned adjacent to the apertureless. Potential spatial resolution of the apertureless NSOM could reach beyond 10 nm. Such strong field enhancement allows the development of a reliable nano-Raman system that can measure mechanical as well as chemical compositions of samples with resolution beyond 10 nm.