The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2012

Filed:

Apr. 24, 2008
Applicants:

Malcolm Abbott, Sunnyvale, CA (US);

Maxim Kelman, Mountain View, CA (US);

Karel Vanheusden, Los Altos, CA (US);

Inventors:

Malcolm Abbott, Sunnyvale, CA (US);

Maxim Kelman, Mountain View, CA (US);

Karel Vanheusden, Los Altos, CA (US);

Assignee:

Innovalight, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/36 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of printing an ink on a wafer surface configured with a set of non-rounded peaks and a set of non-rounded valleys is disclosed. The method includes exposing the wafer including at least some non-rounded peaks and at least some of the non-rounded valleys in a region to an etchant. The method further includes depositing the ink on the region, wherein a set of rounded peaks and a set of rounded valleys are formed.


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