The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2012

Filed:

Aug. 07, 2007
Applicants:

Yoshihiko Ushiyama, Nagano, JP;

Tsuyoshi Kitahara, Nagano, JP;

Yoichi Miyasaka, Nagano, JP;

Inventors:

Yoshihiko Ushiyama, Nagano, JP;

Tsuyoshi Kitahara, Nagano, JP;

Yoichi Miyasaka, Nagano, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/06 (2006.01); B05D 5/12 (2006.01); G06F 3/038 (2006.01); G09G 5/00 (2006.01); B41J 29/38 (2006.01); B41J 2/17 (2006.01);
U.S. Cl.
CPC ...
Abstract

A liquid material arrangement method includes performing a first pattern generating step, a dot deleting step, and a liquid material arranging step. The first pattern generating step includes generating a first dot pattern in which a first prescribed number of dots is set according to the prescribed region. The dot deleting step includes deleting a second prescribed number of dots from the first prescribed number of dots to generate a second dot pattern. The liquid material arranging step includes arranging a liquid material in a prescribed region on a substrate by causing a nozzle and the substrate to scan in relative manner and discharging the liquid material from the nozzle based on the second dot pattern. The performing of the dot deleting step further includes deleting at least one prohibited dot with priority with the prohibited dot being determined based on discharge information of the nozzle determined in advance.


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