The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2012
Filed:
Feb. 24, 2009
Yoku Inoue, Shizuoka, JP;
Morihiro Okada, Shizuoka, JP;
Yoku Inoue, Shizuoka, JP;
Morihiro Okada, Shizuoka, JP;
National University Corporation Shizuoka University, Shizuoka-shi, JP;
Abstract
A chemical vapor deposition (CVD) device is equipped with a reaction vessel tube and a small vessel substrate in an electric furnace and with a heater and a thermocouple at the periphery thereof. A gas supply portion is connected to one of the reaction vessel tubes, and a pressure adjusting valve and an exhaust portion are connected to the other of the reaction vessel tubes, controlled by a control section such that the exhaust portion vacuum-exhausts the reaction vessel tube interior, the heater sublimates the small vessel substrate interior by rising temperature of catalyst iron chloride, and the gas supply portion bleeds an acetylene gas into the reaction vessel tube. As a result, iron chloride and the acetylene gas vapor-phase-react, a silicon oxide surface layer is formed to form growth nucleus of carbon nanotubes, and carbon nanotubes are grown so as to be oriented vertically.