The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2012
Filed:
Dec. 04, 2008
Applicants:
Stanislav Kadlec, Praha, CZ;
Frantisek Balon, Buchs SG, CH;
Juergen Weichart, Balzers, LI;
Bart Scholte Van Mast, Azmoos, CH;
Inventors:
Stanislav Kadlec, Praha, CZ;
Frantisek Balon, Buchs SG, CH;
Juergen Weichart, Balzers, LI;
Bart Scholte van Mast, Azmoos, CH;
Assignee:
OC Oerlikon Blazers AG, Balzers, LI;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01); G01R 23/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of magnetron sputtering, comprises rotating a magnet of a magnetron with an angular frequency ω, and, during sputtering of material from a source of the magnetron onto a substrate, periodically modulating a power level applied to the source with at least a component comprising a frequency f which is a harmonic of the angular frequency ω of rotation of the magnet other than the first harmonic.