The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Feb. 17, 2009
Colin Michael Sayers, Katy, TX (US);
Colin Michael Sayers, Katy, TX (US);
Schlumberger Technology Corporation, Sugar Land, TX (US);
Abstract
In general, in one aspect, the invention relates to a method for determining properties of a subterranean formation. The method includes obtaining a micro-mechanical model for modeling the subterranean formation as a plurality of particles having low aspect ratio pores therebetween, wherein anisotropy of the subterranean formation is represented by normal compliance and shear compliance that describe deformation of the low aspect ratio pores under an applied stress, determining a ratio of normal compliance over shear compliance of the subterranean formation to obtain an estimated ratio of normal compliance over shear compliance, measuring a first formation parameter of the subterranean formation to obtain a measured first formation parameter based on a sonic measurement technique, determining a second formation parameter based on the micro-mechanical model using the estimated ratio of normal compliance over shear compliance and the measured first formation parameter, storing the second formation parameter of the subterranean formation, wherein the first formation parameter and the second formation parameter comprises at least one selected from a group consisting of an anisotropy parameter and a stiffness coefficient of the subterranean formation.