The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
May. 28, 2009
Yuki Oshima, Utsunomiya, JP;
Kenji Yamazoe, Berkeley, CA (US);
Yuki Oshima, Utsunomiya, JP;
Kenji Yamazoe, Berkeley, CA (US);
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A measurement method of the present invention is a measurement method for measuring a shape of a target T from an interference pattern generated by interference between a reflected light of the target and a reference spherical surface. The measurement method includes a first measurement step which positions the target T in a first regionat a light source side with respect to a focal positionof the reference spherical surface to measure the interference pattern, and a second measurement step which positions the target T in a second regionopposite to the first region with respect to the focal positionof the reference spherical surface to measure the interference pattern.