The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Nov. 26, 2007
Stephen Daniels, Dublin, IE;
Justin Lawler, County Dublin, IE;
Victor John Law, County Westmeath, IE;
Stephen Daniels, Dublin, IE;
Justin Lawler, County Dublin, IE;
Victor John Law, County Westmeath, IE;
Dublin City University, Dublin, IE;
Abstract
A plasma system () has a circuit including a DC source (), a power supply line (), an electrodes (), and a return line (). A perturbation signal source () delivers a perturbation signal into the circuit in addition to DC voltage from the DC source (). Acquisition () and analysis () systems measure response to the perturbation. The analysis system () measures variation in impedance of the circuit and phase between voltage and current in the circuit. It also uses a frequency domain reflectrometry technique to measure signal reflection modulus of a supply line of the circuit over a defined frequency range.