The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2012

Filed:

Feb. 04, 2010
Applicant:

Akiko Tsukamoto, Chiba, JP;

Inventor:

Akiko Tsukamoto, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/8605 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a method which is capable of producing polycrystalline silicon resistors with a high ratio accuracy so that a precision resistor circuit may be designed. A semiconductor device has a structure in which an occupation area of a metal portion covering a low concentration impurity region constituting each of the polycrystalline silicon resistors is adjusted so that ratio accuracy may be further corrected after a resistance is corrected.


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