The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Dec. 10, 2009
Igor V. Alabugin, Tallahassee, FL (US);
Boris Breiner, Tallahassee, FL (US);
Joerg C. Schlatterer, Tallahassee, FL (US);
Serguei V. Kovalenko, Tallahassee, FL (US);
Nancy L. Greenbaum, Tallahassee, FL (US);
Igor V. Alabugin, Tallahassee, FL (US);
Boris Breiner, Tallahassee, FL (US);
Joerg C. Schlatterer, Tallahassee, FL (US);
Serguei V. Kovalenko, Tallahassee, FL (US);
Nancy L. Greenbaum, Tallahassee, FL (US);
Florida State University Research Foundation, Inc., Tallahassee, FL (US);
Abstract
A process of forming a double strand cleavage in DNA includes providing a reaction mixture containing double stranded DNA having a break in a first strand defining a target site in a second strand. The method continues by adding to the reaction mixture a photoreactive lysine conjugate selected from a lysine-enediyne conjugate, a lysine-acetylene conjugate or a combination thereof, for a time sufficient for the lysine conjugate to bind to the DNA adjacent the target site. The reaction mixture is then irradiated with electromagnetic radiation sufficient to photoactivate the lysine conjugate to cleave the second strand adjacent the target site.