The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
May. 22, 2008
Hitoshi Yamato, Takarazuka, JP;
Toshikage Asakura, Minoo, JP;
Akira Matsumoto, Hyogo, JP;
Peter Murer, Allschwil, CH;
Tobias Hintermann, Basel, CH;
Hitoshi Yamato, Takarazuka, JP;
Toshikage Asakura, Minoo, JP;
Akira Matsumoto, Hyogo, JP;
Peter Murer, Allschwil, CH;
Tobias Hintermann, Basel, CH;
BASF SE, Ludwigshafen, DE;
Abstract
Compounds of the formula I or II wherein Ris C-Chaloalkylsulfonyl, halobenzenesulfonyl, C-Chaloalkanoyl, halobenzoyl; Ris halogen or C-Chaloalkyl; Aris phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar'is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D-D-phenylene or —Ar″-A-Y-A-Ar″—; wherein these radicals optionally are substituted; Ar″is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; Ais for example a direct bond, —O—, —S—, or —NR—; Yinter alia is C-Calkylene; X is halogen; D is for example —O—, —S— or —NR—; Dinter alia is C-Calkylene; are particularly suitable as photolatent acids in ArF resist technology.