The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2012

Filed:

Nov. 12, 2009
Applicants:

Dong-youn Shin, Daejeon, KR;

Taik-min Lee, Daejeon, KR;

Inventors:

Dong-Youn Shin, Daejeon, KR;

Taik-Min Lee, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/00 (2006.01); C08J 7/18 (2006.01); G21H 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a method for fabricating fine conductive patterns using a surface modified mask template, the method including: depositing a high molecular substance on a substrate; applying a hydrophobic material onto the high molecular substance so that the hydrophobic material can infiltrate into the high molecular substance; forming a mask template by removing a part of the high molecular substance to form a recess where a region of the substrate is exposed to an outside; depositing conductive ink on the mask template; and performing annealing to abstract metal particles from a metallic compound dissolved in the conductive ink so that an insulating pattern can be formed in a region on which the high molecular substance is deposited, but a conductive pattern can be formed as the metal particles are abstracted from the conductive ink in the recess and cohere with each other.


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