The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Mar. 12, 2008
Kazuhiko Ohmuro, Saitama, JP;
Takayuki Izumi, Tokyo, JP;
Ryoji Shigemasa, Tokyo, JP;
Tomoyuki Ohshima, Tokyo, JP;
Kazuhiko Ohmuro, Saitama, JP;
Takayuki Izumi, Tokyo, JP;
Ryoji Shigemasa, Tokyo, JP;
Tomoyuki Ohshima, Tokyo, JP;
Oki Semiconductor Co., Ltd., Tokyo, JP;
Abstract
A method of manufacturing a semiconductor device having a process for cleaning a semiconductor substrate after the semiconductor substrate is etched for patterning includes a first process of preparing the semiconductor substrate having a first temperature, a second process of setting the semiconductor substrate at a second temperature, a third process of etching the semiconductor substrate having the second temperature by etching liquid having a third temperature, a fourth process of cleaning the semiconductor substrate to which the etching liquid is adhered, by ultrapure water having a fourth temperature, wherein the second temperature is set at the range between the first and the third temperatures.