The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 14, 2012

Filed:

Dec. 29, 2008
Applicants:

Shin-in Lin, Tainan, TW;

Chi-hung Lin, Keelung, TW;

Ming-chuan HU, Taipei County, TW;

Xiao-yong Hsu, Taipei, TW;

Inventors:

Shin-In Lin, Tainan, TW;

Chi-Hung Lin, Keelung, TW;

Ming-Chuan Hu, Taipei County, TW;

Xiao-Yong Hsu, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A gas mixing apparatus including a chamber, a filter, a gas transmitting unit and a porous layer is provided. The chamber includes a gas inlet and a gas outlet. The filter, which has at least one opening, is disposed at the gas outlet of the chamber. An environmental gas outside the chamber is filtered and becomes a clean gas after flowing through the filter into the chamber. The gas transmitting unit is connected to the opening of the filter to transmit a gas to be mixed into the chamber through the opening. The porous layer is disposed at the gas outlet. The gas to be mixed is mixed with the clean gas and leaves the chamber through the porous layer.


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