The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
May. 29, 2007
Applicants:
Benoit Guizard, Creteil, FR;
Francois Tenegal, Paris, FR;
Inventors:
Benoit Guizard, Creteil, FR;
Francois Tenegal, Paris, FR;
Assignee:
Commissariat a l'Energie Atomique, Paris, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F 9/12 (2006.01); B01J 12/02 (2006.01); B82B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a gas phase method for producing nanometric particles in a reactor for producing particles in a gas phase, in which there is an interaction between a reaction flow and an energy flow. This method comprises the following steps: a step for coupling a device for producing gaseous chlorides with this reactor, a step for producing gaseous chlorides from a base precursor in the form of powders, and a step for injecting such a reaction flow into the reactor.