The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
Nov. 20, 2007
Soo-kyun Kim, Seoul, KR;
Soo-Kyun Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;
Abstract
Disclosed is a method of extracting ridge and valley lines from three-dimensional point data, the method including the steps of: receiving undefined point data obtained from a three-dimensional scanning system; estimating a normal vector by principal component analysis so as to calculate a normal vector with regard to each received point; and on the basis of such information, creating a moving least squares (MLS) surface of points approximation with regard to each received point. Then, Delaunay edge is created by a Voronoi diagram with regard to each point from the created MLS surface of points; and ridge (or valley) points are extracted by measuring zero-crossing on each Delaunay edge. Ridges and valleys as lines are created by connecting the extracted ridge points in a principal curvature direction. The extraction of ridge and valley lines is used as a pre-processing step for creating three-dimensional points into mesh data, and is advantageous for identifying general model features.