The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
May. 18, 2010
Pascal Deladurantaye, St-Joseph de la Pointe-Lévy, CA;
Louis Desbiens, St-Augustin-de-Desmaures, CA;
Yves Taillon, Saint-Augustin-de-Desmaures, CA;
Dany Lemieux, Québec, CA;
Brian W. Baird, Portland, OR (US);
Pascal Deladurantaye, St-Joseph de la Pointe-Lévy, CA;
Louis Desbiens, St-Augustin-de-Desmaures, CA;
Yves Taillon, Saint-Augustin-de-Desmaures, CA;
Dany Lemieux, Québec, CA;
Brian W. Baird, Portland, OR (US);
Institut National d'Optique, Quebec, Quebec, CA;
Abstract
Methods stabilize the output of a pulsed laser system using pulse shaping capabilities. In some embodiments, transient effects following a transition between a QCW regime and a pulse shaping regime are mitigated by ensuring that the average QCW optical power substantially corresponds to the average pulsed optical power outputted in a steady-state operation of the pulsed laser system in the pulse shaping regime. The QCW signal or the pulse shaping signal may be adapted for this purpose. In other embodiments, transient effects associated with non-process pulses emitted between series of consecutive process pulses are mitigated through the proper use of sequential pulse shaping.