The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2012

Filed:

Dec. 04, 2008
Applicants:

Hisayuki Yamatsu, Tokyo, JP;

Kunihiko Hayashi, Kanagawa, JP;

Norihiro Tanabe, Kanagawa, JP;

Inventors:

Hisayuki Yamatsu, Tokyo, JP;

Kunihiko Hayashi, Kanagawa, JP;

Norihiro Tanabe, Kanagawa, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/20 (2006.01); G03H 1/22 (2006.01); G03H 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A hologram medium manufacturing method that includes disposing a first pair of master hologram media with a predetermined interval so that the first pair of the master hologram media face each other; forming a master hologram in the master hologram media by irradiating the first pair of the master hologram media with spherical wave light and reference light so that the spherical wave light and the reference light interfere with each other in the master hologram media. The spherical wave light and the reference light have a focal point between the first pair of the master hologram media. The method also includes disposing a hologram medium between the first pair of the master hologram media; and forming a hologram in the hologram medium by irradiating the first pair of the master hologram media with the reference light.


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