The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2012

Filed:

Sep. 26, 2008
Applicants:

Po-kai Chiu, Hsinchu, TW;

Wen-hao Cho, Hsinchu, TW;

Hung-ping Chen, Yongkang, TW;

Han-chang Pan, Taichung, TW;

Chien-nan Hsiao, Fongyuan, TW;

Inventors:

Po-Kai Chiu, Hsinchu, TW;

Wen-Hao Cho, Hsinchu, TW;

Hung-Ping Chen, Yongkang, TW;

Han-Chang Pan, Taichung, TW;

Chien-Nan Hsiao, Fongyuan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 15/01 (2006.01); C23C 28/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.


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