The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
Apr. 08, 2004
Kallol Bera, San Jose, CA (US);
Heeyeop Chae, San Jose, CA (US);
Hamid Tavassoli, Cupertino, CA (US);
Yan YE, Saratoga, CA (US);
Kallol Bera, San Jose, CA (US);
Heeyeop Chae, San Jose, CA (US);
Hamid Tavassoli, Cupertino, CA (US);
Yan Ye, Saratoga, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Apparatus for controlling the flow of a gas between a process region and an exhaust port in a semiconductor substrate processing chamber is provided. The apparatus includes at least one restrictor plate supported within the semiconductor processing chamber and at least partially circumscribing a substrate support pedestal. The restrictor plate is adapted to control the flow of at least one gas flowing between the process region and the exhaust port.