The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2012
Filed:
Oct. 21, 2009
Wuhua Yang, Ann Arbor, MI (US);
Robert Bruce Tilove, Rochester Hills, MI (US);
Wuhua Yang, Ann Arbor, MI (US);
Robert Bruce Tilove, Rochester Hills, MI (US);
GM Global Technology Operations LLC, Detroit, MI (US);
Abstract
A method to detect and rank appearance distortions includes creating virtual models of a reference panel and a processed panel, including a first reference patch and the processed panel, respectively. Projecting a first simulated light pattern on the reference panel and the processed panel, and viewing the first reference patch and the first processed patch from a first viewpoint with respect to the first simulated light pattern. The method compares a first reference reflection at the first reference patch with a first processed reflection at the first processed patch, and creates a first index value from optical variations between the appearance of the reference and processed reflections. The first index value is output in a computer readable format. The method may compare the first index value to a predetermined index value and determine whether the processed panel is within an acceptable appearance quality threshold.