The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2012
Filed:
Dec. 16, 2004
Masayuki Ooe, Ibaraki, JP;
Hiroshi Komatsu, Ibaraki, JP;
Yoshiko Tsumaru, Ibaraki, JP;
Dai Kawasaki, Ibaraki, JP;
Kouji Katou, Ibaraki, JP;
Takumi Ueno, Ibaraki, JP;
Masayuki Ooe, Ibaraki, JP;
Hiroshi Komatsu, Ibaraki, JP;
Yoshiko Tsumaru, Ibaraki, JP;
Dai Kawasaki, Ibaraki, JP;
Kouji Katou, Ibaraki, JP;
Takumi Ueno, Ibaraki, JP;
Hitachi Chemical Dupont Microsystems Ltd., Tokyo, JP;
Abstract
A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and Rand Reach independently represents fluoroalkyl group having 1 to 3 carbon atoms.