The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
Mar. 25, 2010
Venkata Ramana Kapuram, Sunnyvale, CA (US);
Rajiv K. Maheshwari, Saratoga, CA (US);
Richard Sarwal, Portola Valley, CA (US);
Venkata Ramana Kapuram, Sunnyvale, CA (US);
Rajiv K. Maheshwari, Saratoga, CA (US);
Richard Sarwal, Portola Valley, CA (US);
Oracle International Corporation, Redwood Shores, CA (US);
Abstract
Techniques for improved metric correlation and analysis include, during a modeling phase, a user familiar with the types of system components deployed in an enterprise network and the metrics available for those types of system components specifying dependencies between metrics in a metric dependency model. During a binding phase, the metric dependency model is provided to a modified enterprise management (MEM) system which binds the model to particular enterprise system environment. During a metric correlation and analysis phase, the MEM system provides a user-interface through which a user visually compares metric data for metrics collected from system components deployed in an enterprise system environment bound to the model. The improved metric correlation analysis techniques allow users to more easily identify whether degradation in the performance of one metric is caused by performance degradation of underlying information technology system components as measured by related metrics specified in the metric dependency model.