The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Aug. 17, 2009
Applicant:

Ichiro Hirata, Tokyo, JP;

Inventor:

Ichiro Hirata, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

An FEM analysis system is provided which is capable of analyzing with high accuracy and within a short time in a drop shock analysis of electronic devices in which a very small mesh size is incorporated. Processing to be performed by an optimal solution selecting and analyzing section includes a step of checking whether an analysis to be performed is a shock analysis, a step of searching for a minimum mesh size when the analysis to be performed is judged to be a shock analysis, a step of creating a simplified analysis model using the minimum mesh size, a step of performing a preliminary analysis on a simplified model by an implicit method and explicit method, and a step of selecting either of the implicit method or explicit method as an optimal analysis method by comparing results from preliminary analysis, results from these analyses and experiments or exact solution.


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