The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
Feb. 10, 2009
Tomoharu Suzuki, Inagi, JP;
Shinichi Eguchi, Inagi, JP;
Tomoharu Suzuki, Inagi, JP;
Shinichi Eguchi, Inagi, JP;
Fujitsu Limited, Kawasaki, JP;
Fujitsu Frontech Limited, Tokyo, JP;
Abstract
A pattern alignment method performs alignment of the comparison source pattern or the comparison target pattern that has been subjected to the angle-scale conversion with the comparison source pattern. Angular deviations and scale factors between the comparison source pattern and the comparison target pattern are computed separately, after angle and scale conversion, the measured template matching is performed. Therefore, parallel-displacement alignment can be made faster and precise alignment is possible. Template matching processing can be minimized, and aligning can be performed precisely and rapidly.
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