The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Oct. 17, 2008
Applicants:

Chan-kyeong Hyon, Gyeonggi-do, KR;

Young-seog Kang, Gyeonggi-do, KR;

Sang-ho Lee, Gyeonggi-do, KR;

Hyun-jong Lee, Busan, KR;

Inventors:

Chan-Kyeong Hyon, Gyeonggi-do, KR;

Young-Seog Kang, Gyeonggi-do, KR;

Sang-Ho Lee, Gyeonggi-do, KR;

Hyun-Jong Lee, Busan, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/36 (2006.01); G06K 9/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern matching method for use in manufacturing a semiconductor memory device increases a pattern matching rate between a GDS image and an SEM image. The pattern matching method includes extracting a scanning electron microscope (SEM) image and a graphic data system (GDS) image to perform a pattern matching; performing a two-dimensional Fourier transform (FFT) for the extracted GDS image and analyzing a low spatial frequency; deciding whether or not a pattern is a repeated pattern or non-repeated pattern by using the analyzed low spatial frequency; and limiting an X/Y range for a pattern matching when the decision result is for the repeated pattern, and then performing the pattern matching between the SEM image and the GDS image.


Find Patent Forward Citations

Loading…