The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Feb. 16, 2010
Applicant:

Ryoji Kondo, Sagamihara, JP;

Inventor:

Ryoji Kondo, Sagamihara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

In an exposing method which illuminates, by illumination light, a mask having apertures arranged in matrix and a latticed light shielding portion, projects the mask on an object to be projected via a projection optical system, and thus forms a dark portion pattern image at a position conjugate in relation to intersections of a lattice of the light shielding portion, an available light source shape of the illumination satisfies a specific condition. Therefore, it is possible to exposure a two-dimensional periodic pattern to a theoretical limit pitch being the same as that of a one-dimensional periodic pattern, and it is also possible to secure a depth of focus sufficiently.


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