The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Jun. 25, 2007
Applicant:

Reed F. Busse, Madion, WI (US);

Inventor:

Reed F. Busse, Madion, WI (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for calculating a flip angle schedule for a train of refocusing radio frequency (RF) pulses with reduced flip angles allows control of RF power deposition and use of a longer echo train. A target signal is defined for each echo in the echo train, and flip angles are then calculated from the target signals. The target signal schedule includes two phases. In the first phase, the target signals drop asymptotically to efficiently establish a pseudo-steady state at a pre-defined minimum signal level, S. In the second phase, the target signal is increased monotonically for the remainder of the train to a pre-defined maximum signal level, S. By increasing the target signal, the effect of relaxation may be reduced, decreasing blurring and ringing artifacts. Flip angles are then calculated from the target signal schedule, using a simplified method that requires no information about the tissues' relaxation properties.


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