The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Mar. 23, 2005
Applicants:

Richard D. Mccullough, Allison Park, PA (US);

Jinsong Liu, Pittsburgh, PA (US);

Paul C. Ewbank, St. Paul, MN (US);

Elena E. Sheina, Pittsburgh, PA (US);

Inventors:

Richard D. McCullough, Allison Park, PA (US);

Jinsong Liu, Pittsburgh, PA (US);

Paul C. Ewbank, St. Paul, MN (US);

Elena E. Sheina, Pittsburgh, PA (US);

Assignee:

Carnegie Mellon University, Pittsburgh, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 75/00 (2006.01); C08G 81/00 (2006.01); C08L 81/00 (2006.01); C08L 75/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to polythiophenes, particularly regioregular head-to-tail poly(3-alkylthiophenes) (HT-PATs), block copolymers made therefrom, and their methods of formation. The present invention provides HT-PATs with well-defined, specific end-groups, functionalization of the defined HT-PATs, and incorporation of end group functionalized HT-PATs into block copolymers with structural polymers. The intrinsically conductive diblock and triblock copolymers, formed from the HT-PATs, have excellent conductivity and low polydispersities that are useful in a number of applications. The block copolymers of the present invention have been found to exhibit conductivities that range from a low of 10S/cm for certain applications to as high as several hundred S/cm or more.


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