The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Nov. 10, 2009
Applicants:

Alan James Lesser, Shutesbury, MA (US);

Naveen Kumar Singh, Amherst, MA (US);

Mohit Mamodia, Chandler, AZ (US);

Inventors:

Alan James Lesser, Shutesbury, MA (US);

Naveen Kumar Singh, Amherst, MA (US);

Mohit Mamodia, Chandler, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 23/00 (2006.01); C08L 25/00 (2006.01); C08J 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed herein is a polymeric composition comprising a polymeric composition comprising a first crosslinked network; and a second crosslinked network; wherein the first crosslinked network is crosslinked at a first stress and/or a first strain and the second crosslinked network is crosslinked at a second stress and/or a second strain; where the first stress and/or the first strain is different from the second stress and/or the second strain either in magnitude or direction. Disclosed herein is a method comprising subjecting a polymeric mass to a first stress and/or a first strain level; crosslinking the polymeric mass to form a first crosslinked network; subjecting the polymeric mass to a second stress and/or a second strain level; and crosslinking the polymeric mass to form a second crosslinked network; where the first stress and/or the first strain level is different from the second stress and/or the second strain level.


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