The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Aug. 18, 2009
Applicants:

Xingcheng Xiao, Troy, MI (US);

Jean M. Dasch, Bloomfield Township, MI (US);

Simon Chin-yu Tung, Rochester Hills, MI (US);

Anil K. Sachdev, Rochester Hills, MI (US);

Inventors:

Xingcheng Xiao, Troy, MI (US);

Jean M. Dasch, Bloomfield Township, MI (US);

Simon Chin-Yu Tung, Rochester Hills, MI (US);

Anil K. Sachdev, Rochester Hills, MI (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C10M 125/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making at least one nanographene layer is disclosed herein. The method includes selecting X hydrocarbon precursor and Y hydrogen gas (H) such that a ratio of X/Y ranges from 0.5 to 1, the hydrocarbon precursor including at least one of CH, CHor CH. The method further includes submitting the hydrocarbon precursor to chemical vapor deposition using the hydrogen gas and argon gas (Ar). As a result, i) the hydrocarbon precursor reacts with the hydrogen gas and argon gas (Ar) according to the following reaction:X hydrocarbon precursor+YH+ZAr→2X graphene+(Y+2X)H+ZAr,where Z ranges from 5*(X+Y) to 10*(X+Y), and ii) the hydrocarbon precursor decomposes and self-assembles to form the at least one nanographene layer.


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