The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8227348 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 24, 2012

Filed:

Jan. 06, 2009
Applicants:

Jae Min Myoung, Koyangsi, KR;

Jyoti Prakash Kar, Seoul, KR;

Inventors:

Jae Min Myoung, Koyangsi, KR;

Jyoti Prakash Kar, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for patterning nanowires on a substrate. The method includes procedures of preparing a substrate having a patterned sacrificial layer of barium fluoride thereon; growing nanowires on an entire surface of the resultant substrate including the patterned sacrificial layer; and removing the patterned sacrificial layer using a solvent to remove part of the nanowires on the patterned sacrificial layer such that part of the nanowires in direct contact with the substrate remains on the substrate to thereby form a nanowire pattern.


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Myoung, Jae. (2012). Method for patterning nanowires on substrate using novel sacrificial layer material (U.S. Patent No. 8227348). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8227348

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