The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
Aug. 11, 2009
Ahn-ho Lee, Gyeonggi-do, KR;
Baik-soon Choi, Gyeonggi-do, KR;
Seung-hyun Ahn, Gyeonggi-do, KR;
Sang-tae Kim, Jeonbuk, KR;
Yong-il Kim, Seoul, KR;
Shi-jin Sung, Seoul, KR;
Kyong-ho Lee, Daejeon, KR;
Ahn-Ho Lee, Gyeonggi-do, KR;
Baik-Soon Choi, Gyeonggi-do, KR;
Seung-Hyun Ahn, Gyeonggi-do, KR;
Sang-Tae Kim, Jeonbuk, KR;
Yong-Il Kim, Seoul, KR;
Shi-Jin Sung, Seoul, KR;
Kyong-Ho Lee, Daejeon, KR;
Samsung Electronics Co., Ltd., , KR;
Dongwoo Fine-Chem Co., Ltd., , KR;
Abstract
In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of γ-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.