The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
May. 10, 2007
Applicants:
Kang-hoon Choi, Dresden, DE;
Klaus Elian, Bubenreuth, DE;
Christoph Hohle, Bubenreuth, DE;
Johannes Kretz, Dresden, DE;
Frank Thrum, Ottobrunn, DE;
Inventors:
Kang-Hoon Choi, Dresden, DE;
Klaus Elian, Bubenreuth, DE;
Christoph Hohle, Bubenreuth, DE;
Johannes Kretz, Dresden, DE;
Frank Thrum, Ottobrunn, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a method with contrast reversal which, inter alia, opens up new areas of application for resists.
Choi, Kang-Hoon. (2012). Method for multiple irradiation of a resist (U.S. Patent No. 8227177). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8227177
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile