The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8227029 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 24, 2012

Filed:

Jun. 06, 2008
Applicants:

Jan Birnstock, Dresden, DE;

Ansgar Werner, Dresden, DE;

Micheal Hofmann, Dresden, DE;

Inventors:

Jan Birnstock, Dresden, DE;

Ansgar Werner, Dresden, DE;

Micheal Hofmann, Dresden, DE;

Assignee:

Novaled AG, Dresden, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method for depositing a vapour deposition material on a base material, in particular for doping a semiconductor material, in which a vapour deposition batch, in which the vapour deposition material is enclosed in an air-tight manner by a shell, is introduced into a vapour deposition chamber and the shell is opened in the vapour deposition chamber, so that the vapour deposition material in the vapour deposition chamber then evaporates and is deposited on the base material, wherein the shell is opened by at least partially melting by heating a meltable shell material which at least partially forms the shell at a melting temperature which is lower than an evaporation temperature of the vapour deposition material.


Find Patent Forward Citations

Birnstock, Jan. (2012). Method for depositing a vapour deposition material (U.S. Patent No. 8227029). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8227029

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