The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2012
Filed:
Dec. 23, 2008
Jun Amako, Matsumoto, JP;
Daisuke Sawaki, Shiojiri, JP;
Jun Amako, Matsumoto, JP;
Daisuke Sawaki, Shiojiri, JP;
Seiko Epson Corporation, , JP;
Abstract
A method for producing a fine structure includes: (a) forming a photosensitive film to cover a plurality of first convex portions formed in at least one surface of a substrate; (b) arranging liquid to cover the photosensitive film on the at least one surface of the substrate; (c) arranging a transparent parallel plate such that the parallel plate opposes the substrate via the liquid; (d) generating interference field by a laser beam to irradiate the interference field onto the photosensitive film via the parallel plate and the liquid; (e) removing the liquid and the parallel plate to develop the photosensitive film so as to form a photosensitive film pattern; and (f) etching the substrate using a mask of the photosensitive film pattern to form a plurality of fine convex portions smaller than the first convex portions on the at least one surface of the substrate. In the method, the liquid arranged at step (b) has a refractive index larger than 1 and equal to or smaller than a refractive index of the photosensitive film.