The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2012

Filed:

Dec. 10, 2007
Applicants:

Timo Hoffart, Darmstadt, DE;

Birgit Falk, Riedstadt, DE;

Iain Mcculloch, Southampton, GB;

Weimin Zhang, Southampton, GB;

Martin Heeney, Southampton, GB;

Inventors:

Timo Hoffart, Darmstadt, DE;

Birgit Falk, Riedstadt, DE;

Iain McCulloch, Southampton, GB;

Weimin Zhang, Southampton, GB;

Martin Heeney, Southampton, GB;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01B 1/00 (2006.01); C08G 75/00 (2006.01); C08G 59/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a process of preparing regioregular polymers, in particular head-to-tail (HT) poly-(3-substituted) thiophenes or selenophenes with high regioregularity and defined molecular weight, to novel polymers prepared by this process, to the use of the novel polymers as semiconductors or charge transport materials in optical, electrooptical or electronic devices including field effect transistors (FETs), electroluminescent, photovoltaic and sensor devices, and to FETs and other semiconducting components or materials comprising the novel polymers.


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