The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2012
Filed:
May. 12, 2008
Yoshitaka Sasaki, Milpitas, CA (US);
Hiroyuki Itoh, Milpitas, CA (US);
Hironori Araki, Milpitas, CA (US);
Shigeki Tanemura, Milpitas, CA (US);
Kazuo Ishizaki, Milpitas, CA (US);
Takehiro Horinaka, Milpitas, CA (US);
Yoshitaka Sasaki, Milpitas, CA (US);
Hiroyuki Itoh, Milpitas, CA (US);
Hironori Araki, Milpitas, CA (US);
Shigeki Tanemura, Milpitas, CA (US);
Kazuo Ishizaki, Milpitas, CA (US);
Takehiro Horinaka, Milpitas, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A magnetic head includes a pole layer, and an encasing layer having a groove that accommodates the pole layer. A manufacturing method for the magnetic head includes the steps of forming a nonmagnetic layer that will later undergo formation of the groove therein and will thereby become the encasing layer; forming the groove in the nonmagnetic layer so that the nonmagnetic layer becomes the encasing layer; and forming the pole layer such that the pole layer is accommodated in the groove of the encasing layer. The nonmagnetic layer is formed of AlO. The step of forming the groove in the nonmagnetic layer includes the step of taper-etching the nonmagnetic layer by reactive ion etching with an etching gas containing at least BCland Namong BCl, Cland N.