The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2012
Filed:
Mar. 12, 2009
Daniel Branton, Lexington, MA (US);
Jene a Golovchenko, Lexington, MA (US);
Gavin M King, Boulder, CO (US);
Warren J Moberlychan, Concord, MA (US);
Gregor M Schurmann, Neuchatel, CH;
Daniel Branton, Lexington, MA (US);
Jene A Golovchenko, Lexington, MA (US);
Gavin M King, Boulder, CO (US);
Warren J MoberlyChan, Concord, MA (US);
Gregor M Schurmann, Neuchatel, CH;
President and Fellows of Harvard College, Cambridge, MA (US);
Abstract
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing an ion beam at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.