The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2012

Filed:

Jan. 31, 2008
Applicants:

Makoto Kasu, Atsugi, JP;

Toshiki Makimoto, Atsugi, JP;

Kenji Ueda, Atsugi, JP;

Yoshiharu Yamauchi, Kunitachi, JP;

Inventors:

Makoto Kasu, Atsugi, JP;

Toshiki Makimoto, Atsugi, JP;

Kenji Ueda, Atsugi, JP;

Yoshiharu Yamauchi, Kunitachi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 25/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for producing a diamond thin-film includes forming a diamond crystal thin-film on a substrate and firing the diamond crystal thin-film at a sufficient temperature under high pressure under which a diamond is stable. A diamond single-crystal substrate having a diamond single-crystal thin-film formed thereon is placed in an ultra-high-pressure and high-temperature firing furnace to anneal the diamond single-crystal thin-film under the conditions of 1200° C. and 6 GPa.


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