The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2012

Filed:

Feb. 03, 2008
Applicant:

Yi Zhao, Beijing, CN;

Inventor:

Yi Zhao, Beijing, CN;

Assignee:

Beijing NMC Co. Ltd., Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H03F 3/04 (2006.01); H05B 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a device and a method for controlling a DC bias of a RF discharge system. Said device comprises a DC bias detection module (), a mode selection module (), a DC bias controlling module () and a RF power providing module (). The mode selection module () receives a parameter and a type of the parameter. If the type of the parameter is representative of voltage, the DC bias controlling module () calculates a power value according to the voltage-related representative parameter and the detected DC bias value, and the RF power providing module () provides power according to the calculated power value. If the type of the parameter is representative of power, the RF power providing module () provides power according to the power-related representative parameter.


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